Paris-Saclay University, Gif-sur-Yvette, Paris, France
Some facts from our history
-
In 2019, the Paris-Saclay University succeeded University of Paris-Sud founded in 1971, which itself succeeded to University of Paris (in Orsay), founded c. 1150.
-
The Paris-Saclay University was established in 2015 as a universities community (ComUE) and in 2019 as a collegiate university, with the aim to become a top-ranking, research-focused French university.
Scientific Committee
Prof. Nabil Anwer(Chair)
Paris-Saclay University, France
Prof. József Váncza
Institute for Computer Science and Control, Hungary
Prof. Kornel Ehmann
Northeastern University, USA
Dr. Christian Wenzel
Innolite GmbH, Germany
Prof. Fengzhou Fang
Tianjin University, China & University College Dublin, Ireland
Prof. Kazuya Yamamura
Osaka University, Japan
Prof. Lihui Wang
KTH Royal Institute of Technology, Sweden
Prof. Xichun Luo
University of Strathclyde, UK
Call for Paper
Atomic and close-to-atomic scale manufacturing (ACSM) aims to realize cost-effective, deterministic, and scalable manufacturing of next-generation products with atomic-level precision by addressing quantum uncertainty in atomic-level material manipulation (removal, migration, and addition). It is the fundamental technology for opening a new manufacturing paradigm - “Manufacturing III”. There is significant frontier and ongoing research in this area. Meanwhile, a new round of industrial digital revolution is being nurtured worldwide, thanks to breakthroughs in emerging Industry 4.0 technologies.
It is our great pleasure to invite you to the 6th AET International Symposium on ACSM and Digital Technologies for Precision Manufacturing (AETS2025).
AIMS: The aim of the symposium is to provide one of the leading international forums for scientists, engineers, scholars and students to exchange latest developments, research findings and visions in the fields of ACSM and digital technologies for precision manufacturing. It also aims to provide a platform to foster R&D collaborations amongst academia, research institutions, and industries where joint research programmes can be formulated for mutual benefits.
Keynotes
Prof. Fred Roozeboom
University of Twente
Current Status and Future Outlook in Atomic-Scale Processing
Abstract:
This keynote focuses on the fundamentals and latest trends in Atomic Layer Processing in sub-10 nm fabrication of 3D-architectures. ALD and ALE have manifested to cost-effectively bridge the >10-years incubation time needed to bring EUV-technology from prototype to commercial use. These techniques can be uniquely used to create 3D-devices in dedicated isotropic (thermal and radical-enhanced) and anisotropic (directional and ion-enhanced) processing modes. Here, energetic species (radicals and/or ions in a plasma) are used in one or two steps, with ions yielding anisotropic profiles (used in FinFET logic and 3D-NAND memory), and neutrals/radicals yielding isotropic profiles to create single-digit-nm features in devices containing horizontal nanowires, nanosheets and ‘forksheets’ in GAA-FETs, and complementary FETs.
Biography:
Fred Roozeboom holds a doctorate in technical sciences from University of Twente (Netherlands) with specialization in inorganic chemistry and catalysis. After three years in catalysis at ExxonMobil R&D Labs in Baton Rouge (USA), he joined Philips Research (from 2007: NXP) in Eindhoven, Netherlands to work most of his life on thin-film technology and plasma processing (1983-2009). From 1997-2009 he led a team that focused here on applications in 3D passive and heterogeneous integration for System-in-Package devices for wireless communication and power management. In 2007 he became Research Fellow and also full professor at TU Eindhoven (2007-2021), working on atomic layer deposition and etching. In 2009 he left NXP to join TNO Holst Centre to work on spatial atomic layer process and reactor design.
In 2021 he left TU Eindhoven and TNO to join University of Twente as guest (emeritus) professor, where his research focuses on inorganic membranes for nanofiltration applications. Since 2021 he is or was also consultant for high-tech industry in applications of thin-film processing in EUV optics lifetime, 3D Li-ion batteries, etching and greenhouse gas emission reduction.
Fred holds over 50 US patents, granted or pending, and published 200+ papers in journals (h-index 44 Scopus). He is ECS Fellow and AVS Fellow, and the winner of the ECS 2023 Gordon E, Moore Medal Award.
Prof. Kazuya Yamamura
University of Osaka
Achieving atomically smooth diamond substrates by plasma-assisted polishing
Abstract:
Diamond has the highest hardness and thermal conductivity among any substance, so it is used in tools for cutting and grinding, X-ray window materials, heat spreader materials, and so on. Recently, due to its excellent electronic properties, it has been expected to be used as a material for quantum devices and power devices. However, diamond is extremely difficult to polish due to its hardness and chemical inertness. In conventional diamond polishing, the scaife polishing using diamond abrasive causes cracks and subsurface damage to the substrate, and in the case of CMP, the material removal rate is very low.
By applying plasma-assisted polishing to the polishing of diamond substrates, we have succeeded in obtaining atomic order surface roughness with high efficiency and without introducing subsurface damage. In this presentation, the characteristics of plasma-assisted polishing for single crystal and polycrystalline diamond substrates will be introduced.
Biography:
Dr. Yamamura is a Distinguished Professor at the University of Osaka and Director of the Center for Precision Engineering at the Graduate School of Engineering. And he is an associate member of CIRP and a fellow of the Japan society for Precision Engineering (JSPE). His research area is development of physicochemical ultraprecision nanomanufacturing method and its application. By using numerically controlled plasma vaporization machining, he succeeded in uniforming the thickness distribution of quartz wafers to less than 2 nm, and contributed to the development of a process for mass-production of the world's smallest quartz crystal units. Furthermore, he invented the plasma-assisted polishing technology, which has succeeded in finishing of difficult-to-polish materials such as GaN and diamond substrates with high efficiency and damage-free.
Prof. Seeram Ramakrishna
National University of Singapore
Electrospinning of Intelligent and Sustainable Materials
Abstract:
Historical observations suggest that humans are increasingly living in a manufactured world. Expectations on the materials for future manufactured products include new functionalities, intelligence and sustainability in addition to the usual performance, availability, and cost criteria.
Intelligent material interacts reversibly with its environment, or responds or adapts to changes in the environment. Two types of intelligent materials are envisaged: a) assisted intelligent materials rely on externalities and b) built-in intelligent materials are fully self-sufficient.
Sustainable material fosters a healthy living ecology via the elimination or reduction of associated greenhouse gas (GHG) emissions, wastage, and resources depletion. They are purposely designed or selected with lower ecological footprint and human health effects, and higher circularity and regenerative potential.
In recent years, electrospinning emerged as a nanotechnology method of manufacturing science and engineering. This seminar illustrates this technology with strategies for producing sustainable and intelligent materials | products.
Biography:
Professor Seeram Ramakrishna is a well-known researcher in electrospinning | nanofibers | nanotechnology at the National University of Singapore, which is ranked among the top three universities in the world for interdisciplinary science. He made seminal contributions in manufacturing innovations as well as understanding and enhancing the biological, chemical, electrical, electronic, mechanical, and physical responses of nanofibers | nanomaterials. He championed cross-fields R&D approach to advance nanofibers in air filtration, liquid | water filtration, composites, regenerative medicine | tissue engineering, energy generation, energy storage, sensors, intelligent materials, and wearables. Electrospinning is now a commonly used R&D technology around the world. He has been named among the World’s Most Influential Minds (Thomson Reuters), and a Highly Cited Researcher. His publications to date have received an H-index of 209 and 205,800 citations. He received a PhD from the University of Cambridge, UK, and TGMP from Harvard University, USA. He also received advanced research experiences at MIT and Johns Hopkins University, USA and KIT, Japan. He is an honorary professor at Tsinghua University, China and IIT Hyderabad, India. He is an elected Fellow | Academician of Chinese Academy of Engineering, China; Indian National Academy of Engineering; UK Royal Academy of Engineering (FREng); Singapore Academy of Engineering; ASEAN Academy of Engineering and Technology; International Academy of Engineering and Technology. He is also an elected Fellow of AAAS, ASM International, ASME, AIMBE, USA; IMechE and IoM3, UK; ISTE, India; and IUBSE (FBSE).
Topics
-
Atomic and Close-to-atomic Scale Manufacturing
-
Micro & Nano Manufacturing Technologies & Applications
-
Precision Replication & Additive Techniques
-
Ultraprecision Machining Technologies at Micro/Nano/Atomic Scales
-
Assembly & Handling in the Micro and Nano Regime
-
Metrology & Quality Control for Micro and Precision Parts and Nano/close-to-atomic Features
-
Precision Measurement, Characterisation and Instrumentation
-
Digital Technologies for Precision Manufacturing
Submission
Please submit your abstract, either one-page or four-page, to SIC: Micro/Nano Manufacturing & 6th AET Symposium on ACSM and Digital Manufacturing 17th – 19th September 2025 – euspen
Publication
All the accepted abstracts will be included in the conference proceedings. Authors of selected abstracts will be invited to submit full articles to Nanomanufacturing and Metrology (Springer) and Precision Engineering (Elsevier).
Registration*
The registration will be handled by euspen. Please visit SIC: Micro/Nano Manufacturing & 6th AET Symposium on ACSM and Digital Manufacturing for Precision Manufacturing 17th – 19th September 2025 – euspen to complete your registration.