Paris-Saclay University, Gif-sur-Yvette, Paris, France
Some facts from our history
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In 2019, the Paris-Saclay University succeeded University of Paris-Sud founded in 1971, which itself succeeded to University of Paris (in Orsay), founded c. 1150.
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The Paris-Saclay University was established in 2015 as a universities community (ComUE) and in 2019 as a collegiate university, with the aim to become a top-ranking, research-focused French university.
Scientific Committee
Prof. Nabil Anwer(Chair)
Paris-Saclay University, France
Prof. József Váncza
Institute for Computer Science and Control, Hungary
Prof. Kornel Ehmann
Northeastern University, USA
Dr. Christian Wenzel
Innolite GmbH, Germany
Prof. Fengzhou Fang
Tianjin University, China & University College Dublin, Ireland
Prof. Kazuya Yamamura
Osaka University, Japan
Prof. Lihui Wang
KTH Royal Institute of Technology, Sweden
Prof. Xichun Luo
University of Strathclyde, UK
Call for Paper
Atomic and close-to-atomic scale manufacturing (ACSM) aims to realize cost-effective, deterministic, and scalable manufacturing of next-generation products with atomic-level precision by addressing quantum uncertainty in atomic-level material manipulation (removal, migration, and addition). It is the fundamental technology for opening a new manufacturing paradigm - “Manufacturing III”. There is significant frontier and ongoing research in this area. Meanwhile, a new round of industrial digital revolution is being nurtured worldwide, thanks to breakthroughs in emerging Industry 4.0 technologies.
It is our great pleasure to invite you to the 6th AET International Symposium on ACSM and Digital Technologies for Precision Manufacturing (AETS2025).
AIMS: The aim of the symposium is to provide one of the leading international forums for scientists, engineers, scholars and students to exchange latest developments, research findings and visions in the fields of ACSM and digital technologies for precision manufacturing. It also aims to provide a platform to foster R&D collaborations amongst academia, research institutions, and industries where joint research programmes can be formulated for mutual benefits.
Keynotes
Prof. Fred Roozeboom
University of Twente
Current Status and Future Outlook in Atomic-Scale Processing
Abstract:
This keynote focuses on the fundamentals and latest trends in Atomic Layer Processing in sub-10 nm fabrication of 3D-architectures. ALD and ALE have manifested to cost-effectively bridge the >10-years incubation time needed to bring EUV-technology from prototype to commercial use. These techniques can be uniquely used to create 3D-devices in dedicated isotropic (thermal and radical-enhanced) and anisotropic (directional and ion-enhanced) processing modes. Here, energetic species (radicals and/or ions in a plasma) are used in one or two steps, with ions yielding anisotropic profiles (used in FinFET logic and 3D-NAND memory), and neutrals/radicals yielding isotropic profiles to create single-digit-nm features in devices containing horizontal nanowires, nanosheets and ‘forksheets’ in GAA-FETs, and complementary FETs.
Biography:
Fred Roozeboom holds a doctorate in technical sciences from University of Twente (Netherlands) with specialization in inorganic chemistry and catalysis. After three years in catalysis at ExxonMobil R&D Labs in Baton Rouge (USA), he joined Philips Research (from 2007: NXP) in Eindhoven, Netherlands to work most of his life on thin-film technology and plasma processing (1983-2009). From 1997-2009 he led a team that focused here on applications in 3D passive and heterogeneous integration for System-in-Package devices for wireless communication and power management. In 2007 he became Research Fellow and also full professor at TU Eindhoven (2007-2021), working on atomic layer deposition and etching. In 2009 he left NXP to join TNO Holst Centre to work on spatial atomic layer process and reactor design.
In 2021 he left TU Eindhoven and TNO to join University of Twente as guest (emeritus) professor, where his research focuses on inorganic membranes for nanofiltration applications. Since 2021 he is or was also consultant for high-tech industry in applications of thin-film processing in EUV optics lifetime, 3D Li-ion batteries, etching and greenhouse gas emission reduction.
Fred holds over 50 US patents, granted or pending, and published 200+ papers in journals (h-index 44 Scopus). He is ECS Fellow and AVS Fellow, and the winner of the ECS 2023 Gordon E, Moore Medal Award.
Topics
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Atomic and Close-to-atomic Scale Manufacturing
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Micro & Nano Manufacturing Technologies & Applications
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Precision Replication & Additive Techniques
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Ultraprecision Machining Technologies at Micro/Nano/Atomic Scales
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Assembly & Handling in the Micro and Nano Regime
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Metrology & Quality Control for Micro and Precision Parts and Nano/close-to-atomic Features
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Precision Measurement, Characterisation and Instrumentation
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Digital Technologies for Precision Manufacturing
Submission
Please submit your abstract, either one-page or four-page, to SIC: Micro/Nano Manufacturing & 6th AET Symposium on ACSM and Digital Manufacturing 17th – 19th September 2025 – euspen
Publication
All the accepted abstracts will be included in the conference proceedings. Authors of selected abstracts will be invited to submit full articles to Nanomanufacturing and Metrology (Springer) and Precision Engineering (Elsevier).
Registration*
The registration will be handled by euspen. Please visit SIC: Micro/Nano Manufacturing & 6th AET Symposium on ACSM and Digital Manufacturing for Precision Manufacturing 17th – 19th September 2025 – euspen to complete your registration.